Residential College | false |
Status | 已發表Published |
Highly tunable and strongly bound exciton in MoSi2 N4 via strain engineering | |
Liang, Dan1,2; Xu, Shi3; Lu, Pengfei1![]() ![]() ![]() | |
2022-05-15 | |
Source Publication | Physical Review B
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ISSN | 2469-9950 |
Volume | 105Issue:19Pages:195302 |
Other Abstract | Motivated by the recently synthesized layered material MoSi2N4, we investigate excitonic response of quasiparticle of monolayer MoSi2N4 by using G0W0 and Bethe-Salpeter equation calculations. With a dually sandwiched structure consisting of a central MoN2 layer analog of 2H-MoS2 capped with silicon-nitrogen (SiN) honeycomb outer layers, MoSi2N4 possesses frontier orbitals confined at the central MoN2 layer with similar subvalley at the K point as 2H-MoS2. The valley splitting (∼130meV) due to the spin-orbital coupling gives rise to a doublet in the spectrum. Excitons in MoSi2N4 show a strong binding energy up to 0.95 eV with the optical band gap of 2.44 eV. Both electronic and optical gaps are highly sensitive to tensile strains and become redshifted, albeit a marginal change of exciton binding energy. With the protection of capped SiN layers, quantum confined excitons in MoSi2N4 without the need of additional passivation layer like BN would provide a bright platform for robust emission with partially screened disturbance from environment. |
DOI | 10.1103/PhysRevB.105.195302 |
URL | View the original |
Indexed By | SCIE |
Language | 英語English |
WOS Research Area | Materials Science ; Physics |
WOS Subject | Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter |
WOS ID | WOS:000804725400003 |
Publisher | AMER PHYSICAL SOC, ONE PHYSICS ELLIPSE, COLLEGE PK, MD 20740-3844 |
Scopus ID | 2-s2.0-85130390095 |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING |
Corresponding Author | Lu, Pengfei; Cai, Yongqing |
Affiliation | 1.State Key Lab. of Info. Photonics and Optical Communications and School of Electronic Engineering, Beijing University of Posts and Telecommunications, Beijing, 100876, China 2.Joint Key Laboratory of the Ministry of Education, Institute of Applied Physics and Materials Engineering, University of Macau, 999078, Macao 3.Department of Physics and Chemistry, Faculty of Science and Technology, University of Macau, 999078, Macao |
First Author Affilication | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING |
Corresponding Author Affilication | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING |
Recommended Citation GB/T 7714 | Liang, Dan,Xu, Shi,Lu, Pengfei,et al. Highly tunable and strongly bound exciton in MoSi2 N4 via strain engineering[J]. Physical Review B, 2022, 105(19), 195302. |
APA | Liang, Dan., Xu, Shi., Lu, Pengfei., & Cai, Yongqing (2022). Highly tunable and strongly bound exciton in MoSi2 N4 via strain engineering. Physical Review B, 105(19), 195302. |
MLA | Liang, Dan,et al."Highly tunable and strongly bound exciton in MoSi2 N4 via strain engineering".Physical Review B 105.19(2022):195302. |
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