| Status | 已發表Published |
| An Evaluation of an End Excited Electron Cyclotron Resonance Plasma Source | |
Mak, P. U.  ; Asmussen, J.
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| 1994-12-01 | |
| Source Publication | Proc. of 1994 IEEE International Conference on Plasma Science
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| Abstract | The multipolu ECR plasma reactor [ 11 is one of the promising, high density plasma sources under consideration for the submicron plasma etching of six-to-eight inch wafers [2]. The usual multipolar reactor employs a single ring of multipolar ECR permanent magnets surrounding the discharge zone. Plasma excitation is through a variable depth coaxial probe placed on the cylindrical side walls of the reactor [3,4]. However, there are several other variations of this reactor concept. Some of these may result in improved reactor performance |
| Keyword | End Excited Electron Cyclotron Resonance Plasma Source |
| Language | 英語English |
| The Source to Article | PB_Publication |
| PUB ID | 40268 |
| Document Type | Conference paper |
| Collection | DEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING |
| Corresponding Author | Mak, P. U. |
| Recommended Citation GB/T 7714 | Mak, P. U.,Asmussen, J.. An Evaluation of an End Excited Electron Cyclotron Resonance Plasma Source[C], 1994. |
| APA | Mak, P. U.., & Asmussen, J. (1994). An Evaluation of an End Excited Electron Cyclotron Resonance Plasma Source. Proc. of 1994 IEEE International Conference on Plasma Science. |
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