| Status | 已發表Published |
| Methods of and Problems Associated with Process Control of Microwave Discharges | |
Asmussen, J.; Mak, P. U. 
| |
| 1993-09-01 | |
| Source Publication | Proc. of 1993 IEEE International Conference on Plasma Science
 |
| Abstract | Recently, microwave discharges have been successfully applied to numerous plasma processing applications. These applications, which range from submicron etching to the deposition of diamond thin films, have indicated a strong potential for application in several commercialhndmtrial process environments. The commercial/factory conditions impose certain automatic/intelligent process criteria on the entire plasma processing system. Thus, new design requirements related to process automation and control are also imposed on microwave plasma reactor design. The control of microwave discharges is a complex nonlinear problem that requires empirical experience as well as an excellent understanding of basic microwave/plasma interactions |
| Keyword | Process Control of Microwave Discharges |
| Language | 英語English |
| The Source to Article | PB_Publication |
| PUB ID | 40269 |
| Document Type | Conference paper |
| Collection | DEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING |
| Corresponding Author | Mak, P. U. |
| Recommended Citation GB/T 7714 | Asmussen, J.,Mak, P. U.. Methods of and Problems Associated with Process Control of Microwave Discharges[C], 1993. |
| APA | Asmussen, J.., & Mak, P. U. (1993). Methods of and Problems Associated with Process Control of Microwave Discharges. Proc. of 1993 IEEE International Conference on Plasma Science. |
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