Residential College | false |
Status | 已發表Published |
Molecular engineering for constructing a D-A system and enhancing delocalization in g-C3N4 with superior photocatalytic activity | |
Xu, Chengqun1; Liu, Xiaolu1; Liu, Haiyang1; Li, Dezhi1; Yang, Yuchen1; Lin, Shiyin1; Fan, Donghua1; Pan, Hui2,3 | |
2022-09-06 | |
Source Publication | Journal of Materials Chemistry A |
ISSN | 2050-7488 |
Volume | 10Issue:39Pages:21031-21043 |
Abstract | A facile “one-pot” method by the Schiff base reaction to construct the D-A structure and enhance the delocalization in the conjugated polymer matrix, g-CN, is reported. The modified g-CN (UCN-xTDA) derived from the copolymerization of thiophene-2,5-dicarbaldehyde (TDA) with urea can promote the transfer and separation of photogenerated carriers and improve the utilization efficiency of photons under visible light. We find that the rate constant for the photodegradation of BPA for optimal UCN-5TDA is 14.4 times that of UCN. Importantly, the average H evolution rate of UCN-5TDA is about 12.35 mmol h g under visible light irradiation, and the apparent quantum efficiency (AQE) can reach 13.3% at 450 nm and 7.93% at 500 nm, which are much better than those of most previously reported g-CN-based photocatalysts. In addition, the remarkable improvement of hydrogen evolution can also be evidenced by polymerizing different precursors (dicyandiamide, melamine, and thiourea) with TDA, indicating that our strategy is universal. The work provides not only insights into the construction of a D-A system and delocalized structures in g-CN to improve photocatalytic activity but a general strategy to design novel photocatalysts. |
DOI | 10.1039/d2ta05482e |
URL | View the original |
Indexed By | SCIE |
Language | 英語English |
WOS Research Area | Chemistry ; Energy & Fuels ; Materials Science |
WOS Subject | Chemistry, Physical ; Energy & Fuels ; Materials Science, Multidisciplinary |
WOS ID | WOS:000854262400001 |
Scopus ID | 2-s2.0-85139955657 |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING |
Corresponding Author | Xu, Chengqun; Pan, Hui |
Affiliation | 1.School of Applied Physics and Materials, Wuyi University, Jiangmen, 529020, China 2.Institute of Applied Physics and Materials Engineering, University of Macau, Macao SAR, 999078, Macao 3.Department of Physics and Chemistry, Faculty of Science and Technology, University of Macau, Macao SAR, 999078, Macao |
Corresponding Author Affilication | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING; Faculty of Science and Technology |
Recommended Citation GB/T 7714 | Xu, Chengqun,Liu, Xiaolu,Liu, Haiyang,et al. Molecular engineering for constructing a D-A system and enhancing delocalization in g-C3N4 with superior photocatalytic activity[J]. Journal of Materials Chemistry A, 2022, 10(39), 21031-21043. |
APA | Xu, Chengqun., Liu, Xiaolu., Liu, Haiyang., Li, Dezhi., Yang, Yuchen., Lin, Shiyin., Fan, Donghua., & Pan, Hui (2022). Molecular engineering for constructing a D-A system and enhancing delocalization in g-C3N4 with superior photocatalytic activity. Journal of Materials Chemistry A, 10(39), 21031-21043. |
MLA | Xu, Chengqun,et al."Molecular engineering for constructing a D-A system and enhancing delocalization in g-C3N4 with superior photocatalytic activity".Journal of Materials Chemistry A 10.39(2022):21031-21043. |
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