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Study of the Electron Gas Behavior in an ECR Multipolar Plasma Source
P. Mak; W. Tan; F.C. Sze; T.A. Grotjohn; J. Asmussen
1992-06
Conference Name1992 IEEE International Conference on Plasma
Source PublicationIEEE Conference Record - Abstracts. 1992 IEEE International Conference on Plasma
Conference Date1-3 June 1992
Conference PlaceTampa, FL, USA, USA
DOI10.1109/PLASMA.1992.697832
Indexed ByCPCI-S
Language英語English
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Document TypeConference paper
CollectionFaculty of Science and Technology
DEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING
AffiliationMichigan State University
Recommended Citation
GB/T 7714
P. Mak,W. Tan,F.C. Sze,et al. Study of the Electron Gas Behavior in an ECR Multipolar Plasma Source[C], 1992.
APA P. Mak., W. Tan., F.C. Sze., T.A. Grotjohn., & J. Asmussen (1992). Study of the Electron Gas Behavior in an ECR Multipolar Plasma Source. IEEE Conference Record - Abstracts. 1992 IEEE International Conference on Plasma.
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