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Stabilization of p-type dopant nitrogen in BeZnO ternary alloy epitaxial thin films
Chen M.1; Xiang R.1; Su L.1; Zhang Q.1; Cao J.1; Zhu Y.1; Gui X.1; Wu T.1; Tang Z.1
2012-11-14
Source PublicationJournal of Physics D: Applied Physics
ISSN00223727 13616463
Volume45Issue:45
Abstract

We demonstrate the growth of Be Zn O alloy thin films on c-sapphire substrates by plasma-assisted molecular beam epitaxy. The formation of Be Zn O is very sensitive to the Be content in the alloy. Be atoms occupy the Zn lattice sites at low Be content, but move partly to the interstitial sites with increasing Be content. We also investigated the thermal stability of N, one of the most frequently used p-type dopants, in the Be Zn O films. Secondary ion mass spectrometry shows that Be element plays a crucial role in stabilizing N in the Be Zn O host, which is favourable in improving the solid solubility and the thermal stability of acceptor dopants in ZnO-based wide-gap semiconductors. © 2012 IOP Publishing Ltd.

DOI10.1088/0022-3727/45/45/455101
URLView the original
Language英語English
WOS IDWOS:000310453400003
Scopus ID2-s2.0-84867641395
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Citation statistics
Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.Sun Yat-Sen University
2.Hong Kong University of Science and Technology
Recommended Citation
GB/T 7714
Chen M.,Xiang R.,Su L.,et al. Stabilization of p-type dopant nitrogen in BeZnO ternary alloy epitaxial thin films[J]. Journal of Physics D: Applied Physics, 2012, 45(45).
APA Chen M.., Xiang R.., Su L.., Zhang Q.., Cao J.., Zhu Y.., Gui X.., Wu T.., & Tang Z. (2012). Stabilization of p-type dopant nitrogen in BeZnO ternary alloy epitaxial thin films. Journal of Physics D: Applied Physics, 45(45).
MLA Chen M.,et al."Stabilization of p-type dopant nitrogen in BeZnO ternary alloy epitaxial thin films".Journal of Physics D: Applied Physics 45.45(2012).
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