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Growth and visible photoluminescence of highly oriented (100) zinc oxide film synthesized on silicon by plasma immersion ion implantation
Mei Y.F.1; Fu R.K.Y.1; Siu G.G.1; Chu P.K.2; Li Z.M.2; Yang C.L.2; Ge W.K.2; Tang Z.K.2; Cheung W.Y.3; Wong S.P.3
2004-12-10
Conference NameSymposium on New Materials in Future Silicon Technology Held at the E-MAR 2004 Spring Meeting
Source PublicationMaterials Science in Semiconductor Processing
Volume7
Issue4-6 SPEC. ISS.
Pages459-462
Conference Date2004
Conference PlaceStrasbourg, FRANCE
Abstract

High-quality (100) ZnO films with smooth surface topography have been synthesized on Si substrate by plasma immersion ion implantation. The materials exhibit compressive stress because of room temperature growth. After annealing at different temperatures, various visible photoluminescence bands are observed. The optical phenomenon as well as the transition mechanism which may involve defects such as [Zni], [VZn], and [Or] induced by the high substrate bias are discussed in this paper. © 2004 Elsevier Ltd. All rights reserved.

KeywordAnnealing Photoluminescence Zno
DOI10.1016/j.mssp.2004.09.021
URLView the original
Language英語English
WOS IDWOS:000225855200052
Scopus ID2-s2.0-9544247761
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Citation statistics
Document TypeConference paper
CollectionUniversity of Macau
Affiliation1.City University of Hong Kong
2.Hong Kong University of Science and Technology
3.Chinese University of Hong Kong
Recommended Citation
GB/T 7714
Mei Y.F.,Fu R.K.Y.,Siu G.G.,et al. Growth and visible photoluminescence of highly oriented (100) zinc oxide film synthesized on silicon by plasma immersion ion implantation[C], 2004, 459-462.
APA Mei Y.F.., Fu R.K.Y.., Siu G.G.., Chu P.K.., Li Z.M.., Yang C.L.., Ge W.K.., Tang Z.K.., Cheung W.Y.., & Wong S.P. (2004). Growth and visible photoluminescence of highly oriented (100) zinc oxide film synthesized on silicon by plasma immersion ion implantation. Materials Science in Semiconductor Processing, 7(4-6 SPEC. ISS.), 459-462.
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