Residential College | false |
Status | 已發表Published |
Growth and visible photoluminescence of highly oriented (100) zinc oxide film synthesized on silicon by plasma immersion ion implantation | |
Mei Y.F.1; Fu R.K.Y.1; Siu G.G.1; Chu P.K.2; Li Z.M.2; Yang C.L.2; Ge W.K.2; Tang Z.K.2; Cheung W.Y.3; Wong S.P.3 | |
2004-12-10 | |
Conference Name | Symposium on New Materials in Future Silicon Technology Held at the E-MAR 2004 Spring Meeting |
Source Publication | Materials Science in Semiconductor Processing |
Volume | 7 |
Issue | 4-6 SPEC. ISS. |
Pages | 459-462 |
Conference Date | 2004 |
Conference Place | Strasbourg, FRANCE |
Abstract | High-quality (100) ZnO films with smooth surface topography have been synthesized on Si substrate by plasma immersion ion implantation. The materials exhibit compressive stress because of room temperature growth. After annealing at different temperatures, various visible photoluminescence bands are observed. The optical phenomenon as well as the transition mechanism which may involve defects such as [Zni], [VZn], and [Or] induced by the high substrate bias are discussed in this paper. © 2004 Elsevier Ltd. All rights reserved. |
Keyword | Annealing Photoluminescence Zno |
DOI | 10.1016/j.mssp.2004.09.021 |
URL | View the original |
Language | 英語English |
WOS ID | WOS:000225855200052 |
Scopus ID | 2-s2.0-9544247761 |
Fulltext Access | |
Citation statistics | |
Document Type | Conference paper |
Collection | University of Macau |
Affiliation | 1.City University of Hong Kong 2.Hong Kong University of Science and Technology 3.Chinese University of Hong Kong |
Recommended Citation GB/T 7714 | Mei Y.F.,Fu R.K.Y.,Siu G.G.,et al. Growth and visible photoluminescence of highly oriented (100) zinc oxide film synthesized on silicon by plasma immersion ion implantation[C], 2004, 459-462. |
APA | Mei Y.F.., Fu R.K.Y.., Siu G.G.., Chu P.K.., Li Z.M.., Yang C.L.., Ge W.K.., Tang Z.K.., Cheung W.Y.., & Wong S.P. (2004). Growth and visible photoluminescence of highly oriented (100) zinc oxide film synthesized on silicon by plasma immersion ion implantation. Materials Science in Semiconductor Processing, 7(4-6 SPEC. ISS.), 459-462. |
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