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InP nanowire avalanche photodiode and bipolar junction phototransistor integrated on silicon substrate
Ko W.S.; Bhattacharya I.; Tran T.; Ng K.W.; Chang-Hasnain C.
2014
Conference Name26th International Conference on Indium Phosphide and Related Materials (IPRM)
Source PublicationConference Proceedings - International Conference on Indium Phosphide and Related Materials
Conference DateMAY 11-15, 2014
Conference PlaceMontpellier, FRANCE
Abstract

Using high quality, single crystalline InP nanowire grown on silicon substrate, we demonstrates sensitive avalanche photodiode with 26.6 A/W and bipolar junction phototransistor with 4 A/W integrated onto silicon substrate. The avalanche photodiode has unique radial p-n junction that allows it to reach a high avalanche gain of 100 at a low bias of 1 V. The bipolar junction phototransistor integrates a sensitive photodiode with a receiver circuit, creating a compact, monolithic receiver circuit for optical interconnect application. These devices are promising in bringing low energy, high bandwidth optical interconnects to silicon electronics. © 2014 IEEE.

DOI10.1109/ICIPRM.2014.6880517
URLView the original
Language英語English
WOS IDWOS:000346124000004
Scopus ID2-s2.0-84906739577
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Citation statistics
Document TypeConference paper
CollectionUniversity of Macau
AffiliationUniversity of California, Berkeley
Recommended Citation
GB/T 7714
Ko W.S.,Bhattacharya I.,Tran T.,et al. InP nanowire avalanche photodiode and bipolar junction phototransistor integrated on silicon substrate[C], 2014.
APA Ko W.S.., Bhattacharya I.., Tran T.., Ng K.W.., & Chang-Hasnain C. (2014). InP nanowire avalanche photodiode and bipolar junction phototransistor integrated on silicon substrate. Conference Proceedings - International Conference on Indium Phosphide and Related Materials.
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