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Phase transformation behavior of (Pb,La)(Zr,Sn,Ti)O3 and Pb (Nb,Zr,Sn,Ti)O3 antiferroelectric thin films deposited on LaNiO 3-buffered silicon substrates by sol-gel processing
Zhai J.1; Shen B.1; Yao X.1; Xu Z.2; Li X.2; Chen H.2
2007-06-01
Source PublicationJournal of Sol-Gel Science and Technology
ISSN09280707
Volume42Issue:3Pages:369-373
Abstract

Antiferroelectric (Pb,La)(Zr,Sn,Ti)O (PLZST) and Pb(Nb,Zr,Sn,Ti)O (PNZST) thin films have been fabricated on LaNiO/Pt/Ti/SiO/Si substrates by a sol-gel processing. These films showed highly preferred (100) orientation due to the grain-on-grain local epitaxial growth. The PLZST films close to the AFE-FE phase boundary showed the electric-field-induced ferroelectric (FE) state, which could return back to its original AFE state only when the thermal activation was high enough. The AFE to FE phase transformation in PNZST films can be adjusted by the dc bias field in temperature. Phase transformation behavior of PNZST and PLZST antiferroelectric thin films were investigated as a function of temperature and dc bias field. © Springer Science + Business Media, LLC 2007.

KeywordAntiferroelectric Electrical Property Phase Transformation Sol-gel Process Thin Film
DOI10.1007/s10971-007-0767-z
URLView the original
Language英語English
WOS IDWOS:000245899500026
Scopus ID2-s2.0-34247403399
Fulltext Access
Citation statistics
Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.Tongji University
2.City University of Hong Kong
Recommended Citation
GB/T 7714
Zhai J.,Shen B.,Yao X.,et al. Phase transformation behavior of (Pb,La)(Zr,Sn,Ti)O3 and Pb (Nb,Zr,Sn,Ti)O3 antiferroelectric thin films deposited on LaNiO 3-buffered silicon substrates by sol-gel processing[J]. Journal of Sol-Gel Science and Technology, 2007, 42(3), 369-373.
APA Zhai J.., Shen B.., Yao X.., Xu Z.., Li X.., & Chen H. (2007). Phase transformation behavior of (Pb,La)(Zr,Sn,Ti)O3 and Pb (Nb,Zr,Sn,Ti)O3 antiferroelectric thin films deposited on LaNiO 3-buffered silicon substrates by sol-gel processing. Journal of Sol-Gel Science and Technology, 42(3), 369-373.
MLA Zhai J.,et al."Phase transformation behavior of (Pb,La)(Zr,Sn,Ti)O3 and Pb (Nb,Zr,Sn,Ti)O3 antiferroelectric thin films deposited on LaNiO 3-buffered silicon substrates by sol-gel processing".Journal of Sol-Gel Science and Technology 42.3(2007):369-373.
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