| Residential College | false |
| Status | 已發表Published |
| Pattern of x-ray scattering by thermal phonons in si | |
| Wu Z.1; Hong H.1; Aburano R.1; Zschack P.1; Jemian P.1; Tischler J.3; Chen H.1; Luh D.-A.1; Chiang T.-C.1 | |
| 1999 | |
| Source Publication | Physical Review B - Condensed Matter and Materials Physics
 |
| ISSN | 1550235X 10980121 |
| Volume | 59Issue:5Pages:3283-3286 |
| Abstract | Intensity distribution of x-ray scattering by thermal phonons in Si was recorded using synchrotron undulator radiation. A high-energy beam sent through a Si(111) wafer in a transmission Laue geometry yielded a threefold symmetric pattern for the scattering cross section with rich details governed by phonon dispersion, population, and polarization. © 1999 The American Physical Society. |
| DOI | 10.1103/PhysRevB.59.3283 |
| URL | View the original |
| Language | 英語English |
| WOS ID | WOS:000078699300006 |
| Scopus ID | 2-s2.0-0001764243 |
| Fulltext Access | |
| Citation statistics | |
| Document Type | Journal article |
| Collection | University of Macau |
| Affiliation | 1.University of Illinois at Urbana-Champaign 2.Cypress Semiconductor 3.Oak Ridge National Laboratory |
| Recommended Citation GB/T 7714 | Wu Z.,Hong H.,Aburano R.,et al. Pattern of x-ray scattering by thermal phonons in si[J]. Physical Review B - Condensed Matter and Materials Physics, 1999, 59(5), 3283-3286. |
| APA | Wu Z.., Hong H.., Aburano R.., Zschack P.., Jemian P.., Tischler J.., Chen H.., Luh D.-A.., & Chiang T.-C. (1999). Pattern of x-ray scattering by thermal phonons in si. Physical Review B - Condensed Matter and Materials Physics, 59(5), 3283-3286. |
| MLA | Wu Z.,et al."Pattern of x-ray scattering by thermal phonons in si".Physical Review B - Condensed Matter and Materials Physics 59.5(1999):3283-3286. |
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