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Bandgap engineering of layered mono-chalcogenides via pressure
Heqi Xiong1; Ruiping Li1; Yingchun Cheng1; Guichuan Xing2; Wei Huang1,3
2021-04-20
Source PublicationJournal of Applied Physics
ISSN0021-8979
Volume129Issue:15Pages:155703
Abstract

The layered mono-chalcogenide semiconductors MX (M = In, Ga; X = Se, S) have attracted considerable attention due to their high carrier mobility and tunable bandgap, which gives them potential applications in the development of new optoelectronic devices. We have systematically studied the effect of pressure on the band structure evolution and electronic properties of monolayer indium selenide (InSe) using first-principles calculations. The bandgap of monolayer InSe first increases and then decreases with increasing pressure. In addition, monolayer InSe undergoes an indirect to direct bandgap transition at 6.8 GPa. Increasing the pressure further to 10.4 GPa leads to recovery of the indirect bandgap. This indirect-direct bandgap transition is absent in other monolayer MX compounds. The continuous tuning of band structure of monolayer InSe gives them potential applications for pressure-response optoelectronic devices.

DOI10.1063/5.0049053
URLView the original
Indexed BySCIE
Language英語English
WOS Research AreaPhysics
WOS SubjectPhysics, Applied
WOS IDWOS:000641861500001
PublisherAMER INST PHYSICS,1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501
Scopus ID2-s2.0-85104508891
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Citation statistics
Document TypeJournal article
CollectionINSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Corresponding AuthorYingchun Cheng; Guichuan Xing; Wei Huang
Affiliation1.Key Laboratory of Flexible Electronics and Institute of Advanced Materials, Jiangsu National Synergetic Innovation Center for Advanced Materials, Nanjing Tech University, Nanjing, 30 South Puzhu Road, 211816, China
2.Joint Key Laboratory of the Ministry of Education, Institute of Applied Physics and Materials Engineering, University of Macau, Macao
3.Frontiers Science Center for Flexible Electronics (FSCFE), Shaanxi Institute of Flexible Electronics (SIFE), Shaanxi Institute of Biomedical Materials and Engineering (SIBME), Northwestern Polytechnical University (NPU), Xi'an, 127 West Youyi Road, 710072, China
Corresponding Author AffilicationINSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Recommended Citation
GB/T 7714
Heqi Xiong,Ruiping Li,Yingchun Cheng,et al. Bandgap engineering of layered mono-chalcogenides via pressure[J]. Journal of Applied Physics, 2021, 129(15), 155703.
APA Heqi Xiong., Ruiping Li., Yingchun Cheng., Guichuan Xing., & Wei Huang (2021). Bandgap engineering of layered mono-chalcogenides via pressure. Journal of Applied Physics, 129(15), 155703.
MLA Heqi Xiong,et al."Bandgap engineering of layered mono-chalcogenides via pressure".Journal of Applied Physics 129.15(2021):155703.
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