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Metal-2D multilayered semiconductor junctions: layer-number dependent Fermi-level pinning
Wang, Qian1,2; Shao, Yangfan1,3; Gong, Penglai1; Shi, Xingqiang1
2020-01-18
Source PublicationJournal of Materials Chemistry C
ISSN2050-7526
Volume8Issue:9Pages:3113-3119
Abstract

The thickness-dependent performances of metal-two-dimensional (2D) semiconductor junctions in electronics/optoelectronics have attracted increasing attention but, currently, little knowledge about the micro-mechanism of this thickness (or layer-number) dependence is available. Here, by first-principles calculations based on density functional theory, we show that the Fermi-level pinning (FLP) factor of a metal-2D multilayered semiconductor junction (MmSJ) has a sensitive dependence on the layer-number of the MmSJ for few-layer 2D semiconductors, in a proposed extension of FLP theory. Taking a MmSJ with MoS as a typical example, we find that strong pinning arises right at the metal-1st-layer semiconductor interface, while depinning occurs between the MoS layers. The depinning effect mainly contributes to the variation of the FLP factor as a function of the layer-number of the semiconductor, making p-type Schottky barrier contact more favorable in MmSJs than in metal-2D monolayer semiconductor junctions, especially for large work-function metals. Moreover, our results shed light on recent controversial experimental observations relating to MmSJs and metal-2D monolayer semiconductor junctions.

DOI10.1039/c9tc06331e
URLView the original
Indexed BySCIE
Language英語English
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Multidisciplinary ; Physics, Applied
WOS IDWOS:000519972600019
PublisherROYAL SOC CHEMISTRYTHOMAS GRAHAM HOUSE, SCIENCE PARK, MILTON RD, CAMBRIDGE CB4 0WF, CAMBS, ENGLAND
Scopus ID2-s2.0-85081593504
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Document TypeJournal article
CollectionINSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Corresponding AuthorShi, Xingqiang
Affiliation1.Department of Physics and Guangdong Provincial, Key Laboratory for Computational Science and Material Design, Southern University of Science and Technology, Shenzhen, 518055, China
2.Harbin Institute of Technology, Harbin, 150080, China
3.Joint Key Laboratory of the Ministry of Education, Institute of Applied Physics and Materials Engineering, University of Macau, Macao
Recommended Citation
GB/T 7714
Wang, Qian,Shao, Yangfan,Gong, Penglai,et al. Metal-2D multilayered semiconductor junctions: layer-number dependent Fermi-level pinning[J]. Journal of Materials Chemistry C, 2020, 8(9), 3113-3119.
APA Wang, Qian., Shao, Yangfan., Gong, Penglai., & Shi, Xingqiang (2020). Metal-2D multilayered semiconductor junctions: layer-number dependent Fermi-level pinning. Journal of Materials Chemistry C, 8(9), 3113-3119.
MLA Wang, Qian,et al."Metal-2D multilayered semiconductor junctions: layer-number dependent Fermi-level pinning".Journal of Materials Chemistry C 8.9(2020):3113-3119.
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