Residential College | false |
Status | 已發表Published |
Metal-2D multilayered semiconductor junctions: layer-number dependent Fermi-level pinning | |
Wang, Qian1,2; Shao, Yangfan1,3; Gong, Penglai1; Shi, Xingqiang1 | |
2020-01-18 | |
Source Publication | Journal of Materials Chemistry C |
ISSN | 2050-7526 |
Volume | 8Issue:9Pages:3113-3119 |
Abstract | The thickness-dependent performances of metal-two-dimensional (2D) semiconductor junctions in electronics/optoelectronics have attracted increasing attention but, currently, little knowledge about the micro-mechanism of this thickness (or layer-number) dependence is available. Here, by first-principles calculations based on density functional theory, we show that the Fermi-level pinning (FLP) factor of a metal-2D multilayered semiconductor junction (MmSJ) has a sensitive dependence on the layer-number of the MmSJ for few-layer 2D semiconductors, in a proposed extension of FLP theory. Taking a MmSJ with MoS as a typical example, we find that strong pinning arises right at the metal-1st-layer semiconductor interface, while depinning occurs between the MoS layers. The depinning effect mainly contributes to the variation of the FLP factor as a function of the layer-number of the semiconductor, making p-type Schottky barrier contact more favorable in MmSJs than in metal-2D monolayer semiconductor junctions, especially for large work-function metals. Moreover, our results shed light on recent controversial experimental observations relating to MmSJs and metal-2D monolayer semiconductor junctions. |
DOI | 10.1039/c9tc06331e |
URL | View the original |
Indexed By | SCIE |
Language | 英語English |
WOS Research Area | Materials Science ; Physics |
WOS Subject | Materials Science, Multidisciplinary ; Physics, Applied |
WOS ID | WOS:000519972600019 |
Publisher | ROYAL SOC CHEMISTRYTHOMAS GRAHAM HOUSE, SCIENCE PARK, MILTON RD, CAMBRIDGE CB4 0WF, CAMBS, ENGLAND |
Scopus ID | 2-s2.0-85081593504 |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING |
Corresponding Author | Shi, Xingqiang |
Affiliation | 1.Department of Physics and Guangdong Provincial, Key Laboratory for Computational Science and Material Design, Southern University of Science and Technology, Shenzhen, 518055, China 2.Harbin Institute of Technology, Harbin, 150080, China 3.Joint Key Laboratory of the Ministry of Education, Institute of Applied Physics and Materials Engineering, University of Macau, Macao |
Recommended Citation GB/T 7714 | Wang, Qian,Shao, Yangfan,Gong, Penglai,et al. Metal-2D multilayered semiconductor junctions: layer-number dependent Fermi-level pinning[J]. Journal of Materials Chemistry C, 2020, 8(9), 3113-3119. |
APA | Wang, Qian., Shao, Yangfan., Gong, Penglai., & Shi, Xingqiang (2020). Metal-2D multilayered semiconductor junctions: layer-number dependent Fermi-level pinning. Journal of Materials Chemistry C, 8(9), 3113-3119. |
MLA | Wang, Qian,et al."Metal-2D multilayered semiconductor junctions: layer-number dependent Fermi-level pinning".Journal of Materials Chemistry C 8.9(2020):3113-3119. |
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