Residential College | false |
Status | 已發表Published |
Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography | |
Li, Mingjie1; Luo, Wenxin1; Xu, Jingfu1; Zhang, Juan2; Ng, Kar Wei3; Cheng, Xing1 | |
2022-02-15 | |
Source Publication | Microelectronic Engineering |
ISSN | 0167-9317 |
Volume | 256Pages:111722 |
Abstract | As nanoimprint lithography provides promising potential in industrial manufacture, it is highly desirable to fabricate a flexible mold with good surface hardness and corrosion resistance. In this work, a nano-patterned template with amorphous surface was fabricated by magnetron sputtering and electrodeposition. The glassy structure imparted high affinity to oxygen with selective oxidation of Zr, Cu, and Al atoms in ambient atmosphere. These nanoimprint templates, having excellent flexibility, surface hardness, and environmental stability, combined with strong capability for constructing nanopatterns, are advantageous for high-resolution imprint lithography with good industrialization prospects. |
Keyword | Electrodeposition Imprint Lithography Oxidation Sputtering |
DOI | 10.1016/j.mee.2022.111722 |
URL | View the original |
Indexed By | SCIE |
Language | 英語English |
WOS Research Area | Engineering ; Science & Technology - Other Topics ; Optics ; Physics |
WOS Subject | Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied |
WOS ID | WOS:000787886200001 |
Publisher | ELSEVIERRADARWEG 29, 1043 NX AMSTERDAM, NETHERLANDS |
Scopus ID | 2-s2.0-85123248412 |
Fulltext Access | |
Citation statistics | |
Document Type | Journal article |
Collection | INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING |
Corresponding Author | Li, Mingjie; Cheng, Xing |
Affiliation | 1.Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen, 518055, China 2.Department of Environmental Science and Engineering, Southern University of Science and Technology, Shenzhen, 518055, China 3.Institute of Applied Physics and Materials Engineering, University of Macau, Taipa, China |
Recommended Citation GB/T 7714 | Li, Mingjie,Luo, Wenxin,Xu, Jingfu,et al. Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography[J]. Microelectronic Engineering, 2022, 256, 111722. |
APA | Li, Mingjie., Luo, Wenxin., Xu, Jingfu., Zhang, Juan., Ng, Kar Wei., & Cheng, Xing (2022). Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography. Microelectronic Engineering, 256, 111722. |
MLA | Li, Mingjie,et al."Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography".Microelectronic Engineering 256(2022):111722. |
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