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Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography
Li, Mingjie1; Luo, Wenxin1; Xu, Jingfu1; Zhang, Juan2; Ng, Kar Wei3; Cheng, Xing1
2022-02-15
Source PublicationMicroelectronic Engineering
ISSN0167-9317
Volume256Pages:111722
Abstract

As nanoimprint lithography provides promising potential in industrial manufacture, it is highly desirable to fabricate a flexible mold with good surface hardness and corrosion resistance. In this work, a nano-patterned template with amorphous surface was fabricated by magnetron sputtering and electrodeposition. The glassy structure imparted high affinity to oxygen with selective oxidation of Zr, Cu, and Al atoms in ambient atmosphere. These nanoimprint templates, having excellent flexibility, surface hardness, and environmental stability, combined with strong capability for constructing nanopatterns, are advantageous for high-resolution imprint lithography with good industrialization prospects.

KeywordElectrodeposition Imprint Lithography Oxidation Sputtering
DOI10.1016/j.mee.2022.111722
URLView the original
Indexed BySCIE
Language英語English
WOS Research AreaEngineering ; Science & Technology - Other Topics ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
WOS IDWOS:000787886200001
PublisherELSEVIERRADARWEG 29, 1043 NX AMSTERDAM, NETHERLANDS
Scopus ID2-s2.0-85123248412
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Citation statistics
Document TypeJournal article
CollectionINSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Corresponding AuthorLi, Mingjie; Cheng, Xing
Affiliation1.Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen, 518055, China
2.Department of Environmental Science and Engineering, Southern University of Science and Technology, Shenzhen, 518055, China
3.Institute of Applied Physics and Materials Engineering, University of Macau, Taipa, China
Recommended Citation
GB/T 7714
Li, Mingjie,Luo, Wenxin,Xu, Jingfu,et al. Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography[J]. Microelectronic Engineering, 2022, 256, 111722.
APA Li, Mingjie., Luo, Wenxin., Xu, Jingfu., Zhang, Juan., Ng, Kar Wei., & Cheng, Xing (2022). Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography. Microelectronic Engineering, 256, 111722.
MLA Li, Mingjie,et al."Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography".Microelectronic Engineering 256(2022):111722.
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