Preparation of silicon nanopillars array using gold nanoparticles as etching mask

Residential College	false
Status	已發表Published
	Preparation of silicon nanopillars array using gold nanoparticles as etching mask
	Zhao B.-J.; Wang Y.; Zhang Y.-F.
	2007-02-01
Source Publication	Weixi Jiagong Jishu/Microfabrication Technology
ISSN	10038213
Issue	1
Abstract	The regular and uniform nanopillar arrays exhibit potential applications for nano-devices. The uniform gold nano-particle monolayer is formed on silicon substrate by self-assembly and the silicon nanopillar arrays were fabricated by reactive ion etching using gold nano-particles monolayer as etching mask, and the influence of the etch time on the silicon nanopillar arrays was investigated. If the etch time is too long, the over-etching is produced. When the time is less than 120 s, a large area silicon nanopillar or nanocone array can be obtained which their diameter is less than 20 nm and their aspect ratio is larger than 10. The results provide a simple, economic and effective method for fabrication of uniform nanopillar arrays on silicon substrate.
Keyword	Gold nanoparticle Nanopillar array Reactive ion etching Self-assembly
URL	View the original
Language	英語English
Fulltext Access	View Full-Text via Scopus
Document Type	Journal article
Collection	University of Macau
Affiliation	Shanghai Jiao Tong University
Recommended Citation GB/T 7714	Zhao B.-J.,Wang Y.,Zhang Y.-F.. Preparation of silicon nanopillars array using gold nanoparticles as etching mask[J]. Weixi Jiagong Jishu/Microfabrication Technology, 2007(1).
APA	Zhao B.-J.., Wang Y.., & Zhang Y.-F. (2007). Preparation of silicon nanopillars array using gold nanoparticles as etching mask. Weixi Jiagong Jishu/Microfabrication Technology(1).
MLA	Zhao B.-J.,et al."Preparation of silicon nanopillars array using gold nanoparticles as etching mask".Weixi Jiagong Jishu/Microfabrication Technology .1(2007).

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