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Investigation of Multipolar ECR Plasma Source Sensors and Models for Plasma Control Journal article
Mak, P. U., Tsai, M.-H., Natarajan, J., Wright, B., Grotjohn, T., Salam, F., Siegel, M., Asmussen, J.. Investigation of Multipolar ECR Plasma Source Sensors and Models for Plasma Control[J]. Journal of Vacuum Science & Technology A, 1996, 1894-1900.
Authors:  Mak, P. U.;  Tsai, M.-H.;  Natarajan, J.;  Wright, B.;  Grotjohn, T.; et al.
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Sensors And Plasma Processing Control Model