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2014 [1]
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英語English [1]
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Development and Active Disturbance Rejection Control of a Compliant Micro-/Nanopositioning Piezostage with Dual Mode
Journal article
Tang H., Li Y.. Development and Active Disturbance Rejection Control of a Compliant Micro-/Nanopositioning Piezostage with Dual Mode[J]. IEEE Transactions on Industrial Electronics, 2014, 61(3), 1475.
Authors:
Tang H.
;
Li Y.
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TC[WOS]:
140
TC[Scopus]:
150
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Submit date：2018/10/30
Active Disturbance Rejection Control
Atomic Force Microscope (Afm)
Lever Displacement Amplifiers (Ldas)
Micro-/nanopositioning System
Plant Uncertainties
