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Journal article [1]
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2004 [1]
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英語English [1]
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Surface and Coat... [1]
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X-Ray photoelectron spectroscopy characterization of reactively sputtered Ti-B-N thin films
Journal article
Lu Y.H., Zhou Z.F., Sit P., Shen Y.G., Li K.Y., Chen H.. X-Ray photoelectron spectroscopy characterization of reactively sputtered Ti-B-N thin films[J]. Surface and Coatings Technology, 2004, 187(1), 98-105.
Authors:
Lu Y.H.
;
Zhou Z.F.
;
Sit P.
;
Shen Y.G.
;
Li K.Y.
; et al.
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TC[WOS]:
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TC[Scopus]:
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Submit date：2019/04/08
Boron
Hardness
Microstructure
Thin Films
Ti-b-n
X-ray Photoelectron Spectroscopy (Xps)
