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Faculties & Institutes
Faculty of Scie... [11]
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MAK PENG UN [10]
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Journal article [8]
Conference paper [6]
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1997 [3]
1996 [1]
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英語English [14]
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The design and application of electron cyclotron resonance discharges
Journal article
Asmussen Jr. J., Grotjohn T.A., Mak P., Perrin M.A.. The design and application of electron cyclotron resonance discharges[J]. IEEE Transactions on Plasma Science, 1997, 25(6), 1196-1221.
Authors:
Asmussen Jr. J.
;
Grotjohn T.A.
;
Mak P.
;
Perrin M.A.
Favorite
|
TC[WOS]:
47
TC[Scopus]:
58
|
Submit date：2019/03/01
Ecr Microwave Discharges
High-density Plasma Sources
Plasma Processing
Experimental investigation of the matching and impressed electric field of a multipolar electron cyclotron resonance discharge
Journal article
Mak P., Asmussen J.. Experimental investigation of the matching and impressed electric field of a multipolar electron cyclotron resonance discharge[J]. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1997, 15(1), 154-168.
Authors:
Mak P.
;
Asmussen J.
Favorite
|
TC[WOS]:
11
TC[Scopus]:
12
|
Submit date：2019/03/01
Experimental Investigation of the Matching and Impressed Electric Fields of a Multipolar ECR Discharge
Journal article
Mak, P. U., Asmussen, J.. Experimental Investigation of the Matching and Impressed Electric Fields of a Multipolar ECR Discharge[J]. J. Vac. Sci. Technol., A, 1997, 154-168.
Authors:
Mak, P. U.
;
Asmussen, J.
Favorite
|
TC[WOS]:
11
TC[Scopus]:
12
IF:
2.4
/
2.6
|
Submit date：2022/09/01
Em Field In Plasma
Reactor Design And Global Plasma Model
Investigation of Multipolar ECR Plasma Source Sensors and Models for Plasma Control
Journal article
Mak, P. U., Tsai, M.-H., Natarajan, J., Wright, B., Grotjohn, T., Salam, F., Siegel, M., Asmussen, J.. Investigation of Multipolar ECR Plasma Source Sensors and Models for Plasma Control[J]. Journal of Vacuum Science & Technology A, 1996, 1894-1900.
Authors:
Mak, P. U.
;
Tsai, M.-H.
;
Natarajan, J.
;
Wright, B.
;
Grotjohn, T.
; et al.
Favorite
|
IF:
2.4
/
2.6
|
Submit date：2022/09/01
Sensors And Plasma Processing Control Model
Experimental Measurement of the Impressed Electric Field in a Mutlipolar Electron Cyclotron Resonance Plasma Source
Conference paper
Mak, P. U., Asmussen, J.. Experimental Measurement of the Impressed Electric Field in a Mutlipolar Electron Cyclotron Resonance Plasma Source[C], 1995.
Authors:
Mak, P. U.
;
Asmussen, J.
Favorite
|
|
Submit date：2022/09/01
Impressed electric field
ECR plasma source
An Evaluation of an End Excited Electron Cyclotron Resonance Plasma Source
Conference paper
Mak, P. U., Asmussen, J.. An Evaluation of an End Excited Electron Cyclotron Resonance Plasma Source[C], 1994.
Authors:
Mak, P. U.
;
Asmussen, J.
Favorite
|
|
Submit date：2022/09/01
End Excited Electron Cyclotron Resonance Plasma Source
Evaluation of an end excited electron cyclotron resonance plasma source
Conference paper
Mak P., Asmussen J.. Evaluation of an end excited electron cyclotron resonance plasma source[C], 1994.
Authors:
Mak P.
;
Asmussen J.
Favorite
|
TC[Scopus]:
0
|
Submit date：2019/03/01
Control of multipolar electron cyclotron resonance discharges using internal cavity impedance matching
Journal article
Asmussen J., Mak P.. Control of multipolar electron cyclotron resonance discharges using internal cavity impedance matching[J]. Review of Scientific Instruments, 1994, 65(5), 1753-1756.
Authors:
Asmussen J.
;
Mak P.
Favorite
|
TC[WOS]:
10
TC[Scopus]:
12
|
Submit date：2019/03/01
Control of Multipolar ECR Discharges using Internal Impedance Matching
Journal article
Asmussen, J., Mak, P. U.. Control of Multipolar ECR Discharges using Internal Impedance Matching[J]. Rev. Sci. Instrum., 1994, 65(5), 1753-1756.
Authors:
Asmussen, J.
;
Mak, P. U.
Favorite
|
TC[WOS]:
10
TC[Scopus]:
12
IF:
1.3
/
1.5
|
Submit date：2022/09/01
Cavity Impedance Matching
Ecr Discharge Control
Methods of and Problems Associated with Process Control of Microwave Discharges
Conference paper
Asmussen, J., Mak, P. U.. Methods of and Problems Associated with Process Control of Microwave Discharges[C], 1993.
Authors:
Asmussen, J.
;
Mak, P. U.
Favorite
|
|
Submit date：2022/09/01
Process Control of Microwave Discharges
